|
Material Name |
Silicon Dioxide |
|
Molecular Formula |
SiO2 |
|
CAS.No |
60676-86-0 |
|
Molecular Weight |
60.084 |
|
Density |
2.6 g/mL at 25℃(lit.) |
|
Fusing Point |
2230℃ |
|
Boiling Point |
1610℃ |
Microelectronics and Optoelectronics
Insulating layer: In microelectronic equipment, silica film as an insulating layer, can effectively isolate the conductive part of the electronic device, prevent current leakage, and ensure the normal operation of the equipment.
Anti-reflective layer: In optoelectronic devices such as LED, optical lenses and solar cells, silica films are used as anti-reflective layers to reduce the reflection loss of light and improve the transmittance of light or photoelectric conversion efficiency.
Optical waveguide: Silicon dioxide thin films are used as optical waveguide materials in optical fiber communication and integrated optical circuits for transmitting and processing optical signals because of their excellent optical transparency and stability.
Photovoltaic Field
Surface passivation layer: The application of silica thin films on solar cells can reduce the recombination of surface carriers and improve the efficiency of the battery. In addition, as an anti-reflective layer, it can also increase the absorption of light, further improving the performance of the battery.
Surface Protection Field
Anti-corrosion and protective coating: The application of silicon dioxide film on the metal surface can effectively prevent corrosion and wear, and extend the service life of the material. In the protection of cultural heritage, silica films are also used to protect the surfaces of substances that are vulnerable to environmental impacts.