|
Material Name |
Hafnium Oxide |
|
Molecular Formula |
HfO2 |
|
CAS.No |
12055-23-1 |
|
Molecular Weight |
210.489 |
|
Density |
9.68 g/mL at 25℃(lit.) |
|
Fusing Point |
2812℃ |
|
Refractive Index |
2.13 |
Hafnium oxide thin films have high dielectric properties and have important application prospects in microelectronics such as transistors and capacitors.
Optoelectronic devices: Hafnium oxide optical films are also widely used in the field of optoelectronic devices, such as optical waveguides, optical switches, optical modulators, etc. These devices are of great significance in the fields of optical communication, optical computing and optical storage.