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Hafnium Oxide Target

Description:

Hafnium oxide optical films have high refractive index, low loss and good thermal stability, so they can be used to prepare high-performance optical coatings. This kind of coating is widely used in optical communication, optical storage, photoelectric display and other fields.
Technical Parameter

  Material Name

  Hafnium Oxide

  Molecular Formula

  HfO2

  CAS.No

  12055-23-1

  Molecular Weight

  210.489

  Density

  9.68 g/mL at 25℃(lit.)

  Fusing Point

  2812℃

  Refractive Index

  2.13

Product Application

Hafnium oxide thin films have high dielectric properties and have important application prospects in microelectronics such as transistors and capacitors.

Optoelectronic devices: Hafnium oxide optical films are also widely used in the field of optoelectronic devices, such as optical waveguides, optical switches, optical modulators, etc. These devices are of great significance in the fields of optical communication, optical computing and optical storage.