|
Element Introduction |
Elemental Property |
||
|
Chinese Name |
Silicon |
Coefficient of Expansion |
(25℃)2.6μm·m-1·K-1 |
|
Element Symbol |
Si |
Thermal Conductivity |
149W·m-1·K-1 |
|
CAS.No |
7440-21-3 |
Electrical Resistivity |
(20℃)103nΩ·m |
|
State of Matter |
Solidity |
Young's Modulus |
130-188 GPa |
|
Density |
2.33g·cm³ |
Shear Modulus |
51-80 GPa |
|
Fusing Point |
1414℃ |
Bulk Modulus |
97.6 GPa |
|
Boiling Point |
3265℃ |
Mohs Hardness |
7 |
|
Heat of Fusion |
50.21 kJ·mol-1 |
Poisson's Ratio |
0.064-0.28[6] |
|
Heat of Vaporization |
359 kJ·mol-1 |
Magnetic Sequence |
Diamagnetism |
|
Specific Heat Capacity |
19.789 J·mol-1·K-1 |
Crystal Structure |
Diamond |
Application Of Silicon Target In Semiconductor Field
Silicon target material is one of the main materials of semiconductor manufacturing, which is widely used in IC chip, solar cell, LED, sensor and other fields. In semiconductor processes, silicon targets are used to prepare monocrystalline silicon, silicon wafers and silicon films, with extremely high production efficiency and stability to ensure high product quality.
Application Of Silicon Target In Electronic Field
Silicon targets are also widely used in the field of electronics. In the manufacturing process of electronic devices, silicon targets are used to prepare thin film transistors, field effect transistors, transistors, diodes and other devices, and are also used to manufacture silicon based circuit boards, magnetic materials and so on.
Application Of Silicon Target In Optical Field
Silicon targets are also widely used in the field of optics, and are used to manufacture a variety of high-quality optical devices, such as mirrors, lenses, filters, optical glass, etc. The high purity of the silicon target can ensure the clarity, stability and accuracy of the optical device.