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Silicon Target

Description:

Silicon target is a kind of material with high purity, high density and high hardness. It is a group III semiconductor substrate manufactured by advanced technology.
Technical Parameter

Element Introduction

Elemental Property

  Chinese Name

  Silicon

  Coefficient of Expansion

 (25℃)2.6μm·m-1·K-1

  Element Symbol

  Si

  Thermal Conductivity

  149W·m-1·K-1

  CAS.No

  7440-21-3

  Electrical Resistivity

(20℃)103nΩ·m

  State of Matter

  Solidity

  Young's Modulus

  130-188 GPa

  Density

  2.33g·cm³

  Shear Modulus

  51-80 GPa

  Fusing Point

  1414℃

  Bulk Modulus

  97.6 GPa

  Boiling Point

  3265℃

  Mohs Hardness

  7

  Heat of Fusion

  50.21 kJ·mol-1

  Poisson's Ratio

  0.064-0.28[6]

  Heat of Vaporization

  359 kJ·mol-1

  Magnetic Sequence

  Diamagnetism

  Specific Heat Capacity

  19.789 J·mol-1·K-1

  Crystal Structure

  Diamond

Product Application

Application Of Silicon Target In Semiconductor Field

Silicon target material is one of the main materials of semiconductor manufacturing, which is widely used in IC chip, solar cell, LED, sensor and other fields. In semiconductor processes, silicon targets are used to prepare monocrystalline silicon, silicon wafers and silicon films, with extremely high production efficiency and stability to ensure high product quality.


Application Of Silicon Target In Electronic Field

Silicon targets are also widely used in the field of electronics. In the manufacturing process of electronic devices, silicon targets are used to prepare thin film transistors, field effect transistors, transistors, diodes and other devices, and are also used to manufacture silicon based circuit boards, magnetic materials and so on.


Application Of Silicon Target In Optical Field

Silicon targets are also widely used in the field of optics, and are used to manufacture a variety of high-quality optical devices, such as mirrors, lenses, filters, optical glass, etc. The high purity of the silicon target can ensure the clarity, stability and accuracy of the optical device.