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Zirconium Target

Description:

Zirconium target is a material used in thin film deposition process, mainly composed of zirconium (Zr) element. It has a high melting point, good chemical stability and excellent corrosion resistance, which make it ideal for manufacturing semiconductors, optoelectronic devices and decorative films. As a target, zirconium targets are capable of producing high purity zirconium vapors in processes such as physical vapor deposition (PVD), resulting in uniform, high-quality films.
Technical Parameter

  Material Name

  Zirconium

  Molecular Formula

  Zr

  CAS.No

  7440-67-7

  Molecular Weight

  91.224

  Density

  6.49 g/mL at 25℃(lit.)

  Fusing Point

  1852 ºC

  Boiling Point

  4377 ºC

  Electronegativity

  1.33(Pauling scale)

  Solubility

  Insoluble in water

Product Application

· Microelectronics and semiconductors: used as key materials in the manufacture of integrated circuits and semiconductor devices.

· Optical coating: Used to produce various optical films, such as anti-reflection films and filter films.

· Solar cells: used to manufacture light-absorbing and conductive layers to improve the efficiency of solar cells.